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New high-efficiency UV reflector from GEW


August 08, 2009 | By the IPP Desk based on a press release

GEW has announced the launch of C3, a new reflector design for its range of UV curing systems. Based on GEW’s retractable cassette system which is easily removed from the dryer housing, this third-generation reflector cartridge has been developed as a replacement to the existing XC ‘extreme cure’ reflector system used on its VCP and eCP product platforms. ...cont´d

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